一、 Core Features and Performance
1. Extremely high purity and chemical stability
Composition: The silicon dioxide content is usually above 99.99%, and high specification can reach 99.9999% (optical grade).
Corrosion resistance: Except for hydrofluoric acid and hot phosphoric acid, it hardly reacts with other acidic substances. It can also resist the erosion of various chemicals at high temperatures.
Pollution free: With extremely low precipitation, it does not contaminate the medium in contact and is an ideal choice for the semiconductor and biopharmaceutical fields.
2、 Excellent optical performance
Wide transmittance range: High transmittance from ultraviolet to infrared. Especially in the ultraviolet region, its transmittance is much higher than that of ordinary glass.
3. Excellent thermal performance
Extremely low coefficient of thermal expansion: about 1/10~1/20 of ordinary glass. This means that its size remains almost unchanged during rapid temperature changes, and its thermal shock resistance is extremely strong.
High temperature resistance: The softening point can reach up to about 1730 ℃, and the long-term use temperature can reach 1100 ℃.
High thermal stability: can withstand rapid cycling from high temperature to low temperature without breaking.
4. Good electrical performance
High resistivity: The resistivity remains high at high temperatures, making it an excellent high-temperature insulation material.
5. High mechanical performance
High hardness, better wear resistance than ordinary glass, but more brittle than metal and crystal materials, requiring attention to impact prevention.
二，Main application areas
1. Semiconductors and Integrated Circuits
Wafer manufacturing: used as furnace tubes, carriers (quartz boats), baffles, etc. for diffusion furnaces and oxidation furnaces. Its high purity and high temperature resistance ensure that the chip manufacturing process is not contaminated.
Lithography process: Used as a substrate for photomask, it requires extremely high flatness and UV transmittance.
2. Optics and Optoelectronics
UV Optics: Used for lenses, prisms, and window plates in UV lamps (sterilization lamps, mercury lamps), UV spectrometers, and UV lasers.
Infrared optics: used for windows of infrared heaters, infrared thermometers, and infrared spectrometers.
Laser technology: as an optical component and reflector substrate for high-energy laser systems.
3. Chemical and laboratory equipment
Used as corrosion-resistant reactor liner, pipeline, and sight glass.
Beakers, tubes, evaporating dishes, etc. in the laboratory are used to process high-purity or high-temperature chemical reactions.
三，Processing and precautions
Difficult processing: Quartz glass has high hardness and performance, and its cutting, grinding, and polishing require diamond tools and specialized equipment. Hot bending and welding at high temperatures require professional skills and experience.
Precautions for use:
Avoid mechanical impact: Although it has high hardness, its toughness is poor and it is prone to breakage upon impact.
Control thermal shock: Although it has strong resistance to thermal shock, it is still necessary to avoid local and extremely severe temperature changes.
Be cautious when handling chemicals: strictly avoid contact with hydrofluoric acid, fluoride, strong bases, etc.
Cleaning: Organic solvents such as anhydrous ethanol and acetone are usually used for ultrasonic cleaning, or rinsed with deionized water. Avoid using hard objects to scratch the surface.
